Semiconductor devices. Metallization stress void test
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Standard number:
BS EN 62418:2010
Pages:
20
Released:
2010-08-31
ISBN:
978 0 580 62610 4
Status:
Standard
DESCRIPTION
BS EN 62418:2010
This standard BS EN 62418:2010 Semiconductor devices. Metallization stress void test is classified in these ICS categories:
31.080.01 Semiconductor devices in general
IEC 62418:2010 describes a method of metallization stress void test and associated criteria. It is applicable to aluminium (Al) or copper (Cu) metallization.
