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immediate downloadReleased: 2010-08-31
BS ISO 14237:2010
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
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| Standard number: | BS ISO 14237:2010 |
| Pages: | 30 |
| Released: | 2010-08-31 |
| ISBN: | 978 0 580 57402 3 |
| Status: | Standard |
DESCRIPTION
BS ISO 14237:2010
This standard BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials is classified in these ICS categories:
- 71.040.40 Chemical analysis
This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.