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immediate downloadReleased: 2014-07-31
BS ISO 14706:2014
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
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| Standard number: | BS ISO 14706:2014 |
| Pages: | 36 |
| Released: | 2014-07-31 |
| ISBN: | 978 0 580 82725 9 |
| Status: | Standard |
DESCRIPTION
BS ISO 14706:2014
This standard BS ISO 14706:2014 Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy is classified in these ICS categories:
- 71.040.40 Chemical analysis
This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.
The method is applicable to the following:
elements of atomic number from 16 (S) to 92 (U);
contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 to 1 × 1014 atoms/cm2;
contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method (see 3.4).