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Homepage>BS Standards>37 IMAGE TECHNOLOGY>37.020 Optical equipment>BS ISO 20263:2017 Microbeam analysis. Analytical electron microscopy. Method for the determination of interface position in the cross-sectional image of the layered materials
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immediate downloadReleased: 2018-01-04
BS ISO 20263:2017 Microbeam analysis. Analytical electron microscopy. Method for the determination of interface position in the cross-sectional image of the layered materials

BS ISO 20263:2017

Microbeam analysis. Analytical electron microscopy. Method for the determination of interface position in the cross-sectional image of the layered materials

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Standard number:BS ISO 20263:2017
Pages:54
Released:2018-01-04
ISBN:978 0 580 89345 2
Status:Standard
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BS ISO 20263:2017


This standard BS ISO 20263:2017 Microbeam analysis. Analytical electron microscopy. Method for the determination of interface position in the cross-sectional image of the layered materials is classified in these ICS categories:
  • 37.020 Optical equipment
  • 71.040.50 Physicochemical methods of analysis

This document specifies a procedure for the determination of averaged interface position between two different layered materials recorded in the cross-sectional image of the multi-layered materials. It is not intended to determine the simulated interface of the multi-layered materials expected through the multi-slice simulation (MSS) method. This document is applicable to the cross-sectional images of the multi-layered materials recorded by using a transmission electron microscope (TEM) or a scanning transmission electron microscope (STEM) and the cross-sectional elemental mapping images by using an energy dispersive X-ray spectrometer (EDS) or an electron energy loss spectrometer (EELS). This document is also applicable to the digitized image recorded on an image sensor built into a digital camera, a digital memory set in the PC or an imaging plate and the digitalized image converted from an analogue image recorded on the photographic film by an image scanner.