BS ISO 23170:2022 - Surface Chemical Analysis

Standard Number: BS ISO 23170:2022

Pages: 38

Released: 2022-08-03

ISBN: 978 0 539 14473 4

Name: Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Status: Standard

Overview

Introducing the BS ISO 23170:2022, a comprehensive standard dedicated to the field of surface chemical analysis. This document provides detailed guidelines and methodologies for non-destructive depth profiling of nanoscale heavy metal oxide thin films on silicon (Si) substrates using medium energy ion scattering techniques. Released on August 3, 2022, this standard is an essential resource for professionals and researchers working in material science, nanotechnology, and surface chemistry.

Key Features

• Non-Destructive Analysis: The standard emphasizes non-destructive techniques, ensuring that the integrity of the sample is maintained throughout the analysis process.
• Depth Profiling: Provides a detailed methodology for depth profiling, allowing for precise measurement and analysis of thin films at the nanoscale.
• Medium Energy Ion Scattering: Utilizes medium energy ion scattering, a powerful technique for analyzing the composition and structure of thin films.
• Heavy Metal Oxide Thin Films: Specifically focuses on the analysis of heavy metal oxide thin films, which are critical in various advanced technological applications.
• Silicon Substrates: Tailored for use with silicon substrates, a common material in semiconductor and electronic industries.

Why Choose BS ISO 23170:2022?

The BS ISO 23170:2022 standard is a vital tool for anyone involved in the analysis of nanoscale materials. Here are some reasons why this standard stands out:

• Precision and Accuracy: The methodologies outlined in this standard ensure high precision and accuracy in depth profiling, providing reliable and reproducible results.
• Comprehensive Guidelines: With 38 pages of detailed instructions and guidelines, this standard covers all aspects of non-destructive depth profiling, from sample preparation to data interpretation.
• Industry Relevance: The focus on heavy metal oxide thin films and silicon substrates makes this standard highly relevant to industries such as electronics, semiconductors, and nanotechnology.
• Up-to-Date Information: Released in 2022, this standard incorporates the latest advancements and best practices in the field of surface chemical analysis.

Applications

The BS ISO 23170:2022 standard is applicable in a wide range of fields and industries, including:

• Material Science: Essential for researchers and professionals working on the development and characterization of new materials.
• Nanotechnology: Provides critical insights into the properties and behavior of nanoscale materials.
• Electronics and Semiconductors: Vital for the analysis and quality control of thin films used in electronic devices and semiconductor components.
• Surface Chemistry: Offers valuable information for studies related to surface interactions and chemical composition.

Content Overview

The BS ISO 23170:2022 standard is divided into several sections, each focusing on a specific aspect of non-destructive depth profiling. Here is a brief overview of the content:

• Introduction: Provides an overview of the standard, its scope, and its intended applications.
• Methodology: Detailed instructions on the techniques and procedures for non-destructive depth profiling using medium energy ion scattering.
• Sample Preparation: Guidelines for preparing silicon substrates and heavy metal oxide thin films for analysis.
• Data Acquisition: Instructions on how to collect and record data during the analysis process.
• Data Interpretation: Methods for analyzing and interpreting the data obtained from depth profiling.
• Quality Control: Recommendations for ensuring the accuracy and reliability of the analysis results.
• Appendices: Additional information and resources to support the implementation of the standard.

Conclusion

The BS ISO 23170:2022 standard is an indispensable resource for anyone involved in the field of surface chemical analysis. Its comprehensive guidelines and methodologies ensure precise, accurate, and non-destructive depth profiling of nanoscale heavy metal oxide thin films on silicon substrates. Whether you are a researcher, a professional in the electronics industry, or a specialist in nanotechnology, this standard provides the tools and knowledge you need to achieve reliable and reproducible results.

BS ISO 23170:2022

This standard BS ISO 23170:2022 Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering is classified in these ICS categories:

• 71.040.40 Chemical analysis