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Homepage>IEC Standards>IEC 62047-4:2008 - Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
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download between 0-24 hoursReleased: 2008-08-21
IEC 62047-4:2008 - Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS

IEC 62047-4:2008

Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS

Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 4: Spécification générique pour les MEMS

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Standard number:IEC 62047-4:2008
Released:2008-08-21
Language:English/French - Bilingual
DESCRIPTION

IEC 62047-4:2008

IEC 62047-4:2008 describes the generic specifications for micro-electromechanical systems (MEMS) made by semiconductors, which are the basis for specifications given in other parts of this series for various types of MEMS applications such as sensors, RF MEMS, excluding optical MEMS, bio MEMS, micro TAS, and power MEMS. This standard specifies general procedures for quality assessment to be used in IECQ-CECC systems and establishes general principles for describing and testing of electrical, optical, mechanical and environmental characteristics. IEC 62047-4:2008 aids in the preparation of standards that define devices and systems made by micromachining technology, including but not limited to, material characterization and handling, assembly and testing, process control and measuring methods. MEMS described in this standard are basically made of semiconductor material. However, the statements made in this standard are also applicable to MEMS using materials other than semiconductor, for example, polymers, glass, metals and ceramic materials.