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IEC 62418:2010
Semiconductor devices - Metallization stress void test
Dispositifs à semiconducteurs - Essai sur les cavités dues aux contraintes de la métallisation
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| Standard number: | IEC 62418:2010 |
| Released: | 2010-04-22 |
| Language: | English/French - Bilingual |
DESCRIPTION
IEC 62418:2010
IEC 62418:2010 describes a method of metallization stress void test and associated criteria. It is applicable to aluminium (Al) or copper (Cu) metallization.