Don't have a credit card? Never mind we support BANK TRANSFER .

Log inSign up
LANGUAGE en
Menu
STOREHelp centerContactsDelivery chargesABOUT US News
SEARCH
0
Total price
0 EUR
PRICES include / exclude VAT
Homepage>ISO Standards>ISO 14237:2010-Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
download between 0-24 hoursReleased: 2010
ISO 14237:2010-Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

ISO 14237:2010

ISO 14237:2010-Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

Format
Availability
Price and currency
English PDF
Immediate download
155.00 EUR
English Hardcopy
In stock
155.00 EUR
French PDF
Immediate download
155.00 EUR
French Hardcopy
In stock
155.00 EUR
Standard´s number:ISO 14237:2010
Pages:19
Edition:2
Released:2010
DESCRIPTION

ISO 14237:2010


ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
Print