PRICES include / exclude VAT
download between 0-24 hoursReleased: 2004
ISO 17331:2004
ISO 17331:2004-Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
Format
Availability
Price and currency
English PDF
Immediate download
155.00 EUR
English Hardcopy
In stock
155.00 EUR
| Standard´s number: | ISO 17331:2004 |
| Pages: | 18 |
| Edition: | 1 |
| Released: | 2004 |
| Language: | English |
DESCRIPTION
ISO 17331:2004
ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.