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Homepage>ISO Standards>ISO 23170:2022-Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
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download between 0-24 hoursReleased: 2022
ISO 23170:2022-Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

ISO 23170:2022

ISO 23170:2022-Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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Standard´s number:ISO 23170:2022
Pages:29
Edition:1
Released:2022
Language:English
DESCRIPTION

ISO 23170:2022


This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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