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in stockReleased: 2015-08-01
UNE EN 62047-16:2015
Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)
Dispositivos semiconductores. Dispositivos microelectromecánicos. Parte 16: Métodos de ensayo para determinar la tensión residual de películas MEMS. Métodos de curvatura de la oblea y de deflexión del haz (Ratificada por AENOR en agosto de 2015.)
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| Standard number: | UNE EN 62047-16:2015 |
| Pages: | 15 |
| Released: | 2015-08-01 |
| Status: | Standard |
DESCRIPTION
This standard UNE EN 62047-16:2015 Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.) is classified in these ICS categories:
- 31.080.99